Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy
Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy
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硬X射线非球面镜光学器件制作技术及其在纳米光谱中的应用
DOI：
10.1117/12.515127
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发表时间：
2004
期刊：
影响因子：
--
通讯作者：
Y. Ishizaka
中科院分区：
文献类型：
--
作者：
Y. Mori;K. Yamauchi;K. Yamamura;H. Mimura;Y. Sano;A. Saito;K. Endo;A. Souvorov;M. Yabashi;K. Tamasaku;T. Ishikawa;M. Shimura;Y. Ishizaka
我们开发了将数控等离子体CVM和EEM相结合的X射线光学超精密加工系统。在该系统中，获得了具有原子顺序粗糙度的纳米级形状精度。由于这些制造过程利用了化学反应，因此表面没有变形的层。因此，该系统不仅适用于反射光学，也适用于衍射光学。最近，利用该系统制作了形状精度小于3 nm的椭圆镜，并研制了用于安装这些反射镜的K-B布置微聚焦装置。在该装置中，在15keV下获得了尺寸为180(V)×90(H)nm~2的微束X射线。通过扫描微束X射线和探测X射线荧光，观察到一些哺乳动物细胞的内部结构，分辨率为0.2μm。
We developed ultra-precise fabrication system for x-ray optics, which combined numerically controlled plasma CVM and EEM. In this system, nanometer order form accuracy having atomic order roughness is achieved. And there are no deformed layers on the surface because these fabrication processes utilizes chemical reaction. So, this system is effective for not only reflective optics but also for diffractive optics. Recently, elliptical mirrors having less than 3 nm form accuracy are fabricated by utilizing the above system, and K-B arrangement microfocusing unit for installation of these mirrors are developed. In this unit, micro x-ray beam having the size of 180 (V)×90(H) nm2 is achieved at 15 keV. By scanning irradiation of the micro x-ray beam and by detecting x-ray fluorescence, inside structures of some mammalian cells are observed with resolution of 0.2 μm.