Alkali reactions with wall coating materials used in atomic resonance cells
Alkali reactions with wall coating materials used in atomic resonance cells
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与原子共振池中使用的壁涂层材料发生碱反应
DOI：
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发表时间：
1987
期刊：
影响因子：
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通讯作者：
B. Jaduszliwer
中科院分区：
文献类型：
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作者：
J. Camparo;R. Frueholz;B. Jaduszliwer
众所周知，各种氯硅烷材料在玻璃原子存储容器壁上的化学吸附会产生抑制电子和核自旋弛豫的表面涂层。在本研究中，研究了铷以及其他碱金属与二氯二甲基硅烷处理的玻璃表面的化学反应。我们发现证据表明铷与新制备的涂层发生反应，产生氢气和挥发性含硅物质。最合理的反应过程被认为是铷与表面残留的硅烷醇基团（Si-OH）反应。随着反应的进行，这些基团会消失，从而降低与表面相关的自旋弛豫率。我们相信，这种反应会导致其他研究人员报告的墙面涂料的“固化”。同时，气态反应产物变成系统内的杂质。含硅物质的自旋弛豫截面预计小于...
It is well known that the chemisorption of various chlorosilane materials on glass atomic storage vessel walls results in surface coatings which inhibit electronic‐ and nuclear‐spin relaxation. In the present study the chemical reaction of rubidium, and by analogy other alkali metals, with dichlorodimethylsilane‐treated glass surfaces has been studied. We find evidence that rubidium reacts with a freshly prepared coating to produce H2 and a volatile silicon‐containing species. The most reasonable reaction process is postulated to be rubidium reacting with residual silanol groups (Si‐OH) found on the surface. As the reaction proceeds these groups would disappear, thus reducing the spin‐relaxation rate associated with the surface. We believe that this reaction results in the ‘‘curing’’ of wall coatings reported by other investigators. Concurrently, the gaseous reaction products become impurities within the system. The spin‐relaxation cross section of the silicon‐containing species is expected to be less tha...