Fabrication of Nanostructures using a UV-based imprint technique
Fabrication of Nanostructures using a UV-based imprint technique
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DOI：
10.1016/s0167-9317(00)00304-x
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发表时间：
2000-06-01
影响因子：
2.3
通讯作者：
Kurz, H
中科院分区：
文献类型：
--
作者：
Bender, M;Otto, M;Kurz, H
我们提出了一种用于纳米结构制造的改进的纳米技术。该方法是基于通过石英模具的特殊抗蚀剂的光聚合。介绍了模具的制作顺序以及新型抗蚀剂材料的要求和性能。该抗蚀剂适应该工艺，使低压和室温印刷和易于脱离模具成为可能。特殊的改性保证了合适的蚀刻速率和选择性。使用这种技术，在0.8巴的压力下，80%的模具区域被打印出来。成功地打印出单点直径为80nm的点阵列。
We present a modified Nn-technique for the fabrication of nm-structures. The approach is based on the photopolymerization of special resists through a quartz mold. The fabrication sequence for the molds as well as requirements and properties of new resist materials are presented. The resists are adapted to the process, making a low pressure and room temperature printing and an easy detachment of the mold possible. Special modification guarantees suitable etching rates and selectivities. With this technique 80% of the mold area was printed with a pressure of only 0.8 bar. Dot arrays with a single dot diameter of 80nm have been printed successfully.