High-performance deterministic in situ electron-beam lithography enabled by cathodoluminescence spectroscopy
High-performance deterministic in situ electron-beam lithography enabled by cathodoluminescence spectroscopy
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DOI：
10.1088/2632-959x/abed3c
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发表时间：
2021-03-01
期刊：
影响因子：
3
通讯作者：
Reitzenstein, S.
中科院分区：
文献类型：
--
作者：
Rodt, S.;Reitzenstein, S.
固体量子发射体在现实世界量子信息技术中的应用需要具有高加工成品率的精密纳米加工平台。具有优良发射性能的自组装半导体量子点已被证明是满足许多新型量子光子器件需求的最佳候选者之一。然而，它们的空间和光谱位置在统计上的变化范围太大，无法通过固定的光刻和不灵活的处理方案进行系统集成。我们通过引入一种灵活和确定的制造方案来解决这个严重的问题，该方案基于精确和方便的阴极发光光谱，然后是高分辨率电子束光刻。本文介绍了这种先进的电子束原位光刻的基本原理和应用实例。尽管我们在这里将重点放在作为光子发射器的量子点上，但这种纳米技术概念非常适合于制造各种基于量子发射器的量子纳米光子器件，这些量子发射器显示出适当强的阴极发光信号。
The application of solid-state quantum emitters in real-world quantum information technologies requires precise nanofabrication platforms with high process yield. Self-assembled semiconductor quantum dots with excellent emission properties have proven to be among the best candidates to meet the needs of a number of novel quantum photonic devices. However, their spatial and spectral positions vary statistically on a scale that is far too large for their system integration via fixed lithography and inflexible processing schemes. We solve this severe problem by introducing a flexible and deterministic manufacturing scheme based on precise and convenient cathodoluminescence spectroscopy followed by high-resolution electron-beam lithography. The basics and application examples of this advanced in situ electron-beam lithography are described in this article. Although we focus here on quantum dots as photon emitters, this nanotechnology concept is very well suited for the fabrication of a variety of quantum nanophotonic devices based on quantum emitters that exhibit suitably strong cathodoluminescence signals.