Hydrogen behavior in gasochromic tungsten oxide films investigated by elastic recoil detection analysis
Hydrogen behavior in gasochromic tungsten oxide films investigated by elastic recoil detection analysis
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DOI：
10.1016/j.nimb.2007.11.016
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发表时间：
2008-01-01
影响因子：
1.3
通讯作者：
Shikama, Tatsuo
中科院分区：
文献类型：
--
作者：
Inouye, Aichi;Yamamoto, Shunya;Shikama, Tatsuo
采用射频反应磁控溅射法在SiO2和玻碳衬底上同时制备了气致变色氧化钨薄膜，研究了氢的引入对氧化钨薄膜成分和晶体结构的影响。在600 ℃下对沉积膜的X射线衍射分析表明，两种衬底的单斜晶WO 3在（010）平面中具有单轴取向结构。玻璃碳上的薄膜的弹性反冲检测分析（ERDA）和卢瑟福背散射光谱（RBS）表明，氢杂质是均匀分布的浓度为0.24 H/W。当暴露于Ar和5%H-2的混合气体中时，SiO2上的Pd涂层膜变成蓝色。当样品着色时，膜中的氢浓度增加到0.47 H/W，并且膜的晶体结构从单斜晶变为四斜晶。这些结果表明，氧化钨薄膜的气致变色与氢原子进入晶格相一致，对应于氢钨青铜（HxWO 3）的形成。(c)2007 Elsevier B. V.保留所有权利。
Changes in the composition and crystalline structure of gasochromic tungsten oxide films resulting from the incorporation of hydrogen were investigated; the oxide films were prepared by reactive RF magnetron sputtering on SiO2 and glassy carbon substrates simultaneously. X-ray diffraction analysis of the deposited films at 600 degrees C showed a uniaxial oriented structure in the (010) plane of monoclinic WO3 for both substrates. The elastic recoil detection analysis (ERDA) and Rutherford backscattering spectroscopy (RBS) for the films on glassy carbon revealed that the hydrogen impurity was uniformly distributed up to a concentration of 0.24 H/W. The Pd-coated films on SiO2, turned blue when they were exposed to a mixture of Ar and 5% H-2 gases. When the sample became colored, the hydrogen concentration in the film increased to 0.47 H/W and the crystalline structure of the film changed from monoclinic to tetragonal. These results indicated that the gasochromic coloration of the tungsten oxide films coincided with incorporation of hydrogen atoms into the crystalline lattice, corresponding to the formation of hydrogen tungsten bronze (HxWO3). (c) 2007 Elsevier B.V. All rights reserved.