Plasma surface fluorination of ultrananocrystalline diamond films
Plasma surface fluorination of ultrananocrystalline diamond films
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DOI：
10.1016/j.surfcoat.2016.06.029
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发表时间：
2016-09
影响因子：
5.4
通讯作者：
W. Kulisch;A. Voss;D. Merker;J. Reithmaier;R. Merz;M. Kopnarski;C. Popov
中科院分区：
文献类型：
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作者：
W. Kulisch;A. Voss;D. Merker;J. Reithmaier;R. Merz;M. Kopnarski;C. Popov
超纳米晶金刚石薄膜已经受到CHF 3和SF6 rf等离子体，以实现氟终止的表面。除工艺气体的性质外，本研究中变化的主要参数为暴露时间。处理后的表面已被调查的接触角和原子力显微镜测量; X射线光电子能谱已被用来确定的表面组合物，并得到深入了解处理后的表面的结合环境。两种等离子体处理导致相似的结果。表面被含氟基团氟化，即CF、CF 2和CF 3，F浓度约为20%。这导致95-110°的高接触角;表面被轻微蚀刻并且变得稍微光滑。然而，分别由CHF 3和SF 6处理获得的表面之间存在明显差异，本文将讨论其性质以及底层机制。
Ultrananocrystalline diamond films have been subjected to CHF3and SF6rf plasmas in order to achieve a fluorine terminated surface. Major parameter varied in this study was besides the nature of the process gas the exposure time. The treated surfaces have been investigated by contact angle and atomic force microscopy measurements; X-ray photoelectron spectroscopy has been used to determine the surface composition and to get insight into the bonding environments of the treated surfaces. Both plasma treatments lead to similar results. The surfaces are fluorinated by fluorine containing groups, namely CF, CF2, and CF3, with F concentrations of about 20%. This leads to high contact angles of 95–110°; the surfaces are slightly etched and became somewhat smoother.Nevertheless, there are distinct differences between the surface obtained by the CHF3and SF6treatments, respectively, the nature of which will be discussed in this paper, together with the underlaying mechanisms.