Customizing Topographical Templates for Aperiodic Nanostructures of Block Copolymers via Inverse Design
Customizing Topographical Templates for Aperiodic Nanostructures of Block Copolymers via Inverse Design
复制标题
通过逆向设计定制嵌段共聚物非周期纳米结构的形貌模板
DOI：
10.1039/c9cp00712a
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发表时间：
2019
影响因子：
3.3
通讯作者：
Shaoliang Lin
中科院分区：
文献类型：
--
作者：
Runrong Zhang;Liangshun Zhang;Jiaping Lin;Shaoliang Lin
嵌段共聚物自组装纳米结构的有限复杂性严重阻碍了其在半导体工业中的潜在应用。因此，复杂纳米结构的可定制性一直是纳米光刻中利用定向自组装的长期目标。在这里，我们集成了先进的逆设计算法与一个发达的理论模型，推导出逆解的地形模板，以指导自组装成可重复的目标结构的嵌段共聚物。通过微调逆设计算法的输入参数，并通过对称操作以及纳米柱消除来优化推导出的模板。更重要的是，我们开发的算法有能力在非常大的区域搜索的地形模板的逆解的非周期性纳米结构。这些结果揭示了嵌段共聚物器件导向纳米结构模板的设计规则，在纳米光刻中具有广阔的应用前景。
The limited complexity of self-assembled nanostructures of block copolymers seriously impedes their potential utility in the semiconductor industry. Therefore, the customizability of complex nanostructures has been a long-standing goal for the utilization of directed self-assembly in nanolithography. Herein, we integrated an advanced inverse design algorithm with a well-developed theoretical model to deduce inverse solutions of topographical templates to direct the self-assembly of block copolymers into reproducible target structures. The deduced templates were optimized by finely tuning the input parameters of the inverse design algorithm and through symmetric operation as well as nanopost elimination. More importantly, our developed algorithm has the capability to search inverse solutions of topographical templates for aperiodic nanostructures over exceptionally large areas. These results reveal design rules for guiding templates for the device-oriented nanostructures of block copolymers with prospective applications in nanolithography.