Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method
Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method
复制标题
原子力显微镜和组合光学方法分析ZrO2和HfO2薄膜的边界
DOI：
10.1002/sia.1419
复制
发表时间：
2002
影响因子：
1.7
通讯作者：
P. Pokorný
中科院分区：
文献类型：
--
作者：
P. Klapetek;I. Ohlídal;D. Franta;P. Pokorný
本文用原子力显微镜对ZrO2和HfO2薄膜的微孔上边界进行了分析。在此分析中，确定了具有不同厚度的ZrO2和HfO2的宽度值、高度的均方根值和这些边界的功率谱密度函数。介绍了上述量的厚度依赖性。用组合光学方法对膜的厚度值进行了计算。这种光学方法也被用于描述有效介质理论中的边界微粗糙度。讨论了ZrO2和HfO2薄膜上边界微粗糙度的结果。版权所有©2002约翰威利父子有限公司
In this paper an atomic force microscopy analysis of the microrough upper boundaries of ZrO2 and HfO2 thin films is presented. Within this analysis the values of the width, root‐mean‐square value of heights and power spectral density function of these boundaries are determined for ZrO2 and HfO2 exhibiting different thicknesses. The thickness dependences of the quantities mentioned are introduced. The values of the thicknesses of the films are evaluated using the combined optical method. This optical method is also used to describe boundary microroughness within the effective medium theory. A discussion of the results concerning the microroughness of the upper boundaries of both the ZrO2 and HfO2 thin films is also introduced. Copyright © 2002 John Wiley & Sons, Ltd.