Improvement in high temperature stability of Pd coating on Nb by Nb2C intermediate layer
Improvement in high temperature stability of Pd coating on Nb by Nb2C intermediate layer
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DOI：
10.1016/j.ijhydene.2010.08.114
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发表时间：
2007-04
影响因子：
7.2
通讯作者：
Y. Hatano;Keita Ishiyama;H. Homma;Kuniaki Watanabe
中科院分区：
文献类型：
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作者：
Y. Hatano;Keita Ishiyama;H. Homma;Kuniaki Watanabe
为提高Pd-Ta氢分离复合膜的高温稳定性，选择氮化镓(HFN)作为无孔中间层材料。在Ta衬底和Pd薄膜(300 Nm)之间形成了一层致密的HfN(70 Nm)，并通过吸氢实验测试了Pd涂层在573℃下的高温稳定性。虽然HfN在HfN中的渗透率比Pd和Ta的渗透率小，但HfN层具有明显的透氢性能。此外，HfN涂层对高温下Pd涂层效果的退化有显著的抑制作用。这种稳定性的提高归因于阻止了Pd膜中开孔的发展以及Pd和Ta之间的相互扩散。因此，HFN是改善Pd-5金属复合氢分离膜高温稳定性的一种有潜力的中间层材料。
Hafnium nitride (HfN) was chosen as a material for non-porous intermediate layer to improve the high temperature stability of Pd–Ta composite membranes for hydrogen separation. A layer of dense HfN (70 nm) was prepared between Ta substrate and thin Pd film (300 nm), and the high temperature stability of Pd coating was examined by hydrogen absorption experiments at 573 K after the heat treatments at 873 and 973 K. The HfN layer showed obvious hydrogen permeability, though the permeation rate in HfN appeared to be smaller than that in Pd and Ta. In addition, the degradation in coating effects of Pd at elevated temperatures was substantially retarded by HfN layer. Such improved stability was ascribed to retardation of open porosity development in Pd films and interdiffusion between Pd and Ta. It was concluded that HfN is a potential candidate material for intermediate layer to improve high temperature stability of Pd-group 5 metal composite hydrogen separation membranes.