Ion beam exposure characteristics of resists: Experimental results
Ion beam exposure characteristics of resists: Experimental results
复制标题
抗蚀剂的离子束曝光特性：实验结果
DOI：
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发表时间：
1982
期刊：
影响因子：
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通讯作者：
L. F. Thompson
中科院分区：
文献类型：
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作者：
T. Hall;A. Wagner;L. F. Thompson
测量了六种聚合物抗蚀剂对1.5 MeV H+、He+和O+离子以及对20 keV电子的曝光特性。使用的抗蚀剂是聚苯乙烯（PS）、聚甲基丙烯酸甲酯（PMMA）、与20%的乙酸乙烯酯和氯乙烯的共聚物（VMCC）混合的PMMA、聚（甲基丙烯酸缩水甘油酯-共-3-氯苯乙烯）（GMC）、聚（丁烯-1-砜）（PBS）和酚醛清漆。发现暴露抗蚀剂所需的每单位体积的沉积能量是抗蚀剂中离子的空间能量耗散率的函数。这已被占的主要粒子轨道周围的能量分布的性质，结合抗蚀剂是否需要激活一个单一的网站或两个相邻的网站，以产生曝光。
The exposure characteristics of six polymer resists to 1.5 MeV H+, He+, and O+ ions and to 20 keV electrons were measured. The resists used were polystyrene (PS), polymethyl methacrylate (PMMA), PMMA mixed with 20% of a copolymer of vinyl acetate and vinyl chloride (VMCC), poly(glycidyl methacrylate‐co‐3‐chlorostyrene) (GMC), poly(butene‐1‐sulfone) (PBS), and a novolac. The deposited energy per unit volume required to expose a resist was found to be a function of the spatial energy dissipation rate of the ion in the resist. This has been accounted for in terms of the nature of the energy distribution around the primary particle track in conjunction with whether the resist requires the activation of a single site or two adjacent sites to produce exposure.