Towards alternative 3D nanofabrication in macroscopic working volumes
Towards alternative 3D nanofabrication in macroscopic working volumes
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DOI：
10.1088/1361-6501/aadb57
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发表时间：
2018-10
影响因子：
2.4
通讯作者：
M. Kühnel;T. Frohlich;R. Füßl;M. Hoffmann;E. Manske;I. Rangelow;J. Reger;C. Schäffel;S. Sinzinger;Jens-Peter Zöllner
中科院分区：
文献类型：
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作者：
M. Kühnel;T. Frohlich;R. Füßl;M. Hoffmann;E. Manske;I. Rangelow;J. Reger;C. Schäffel;S. Sinzinger;Jens-Peter Zöllner
本文概述了在TU Ilmenau进行的研究，在扩展的宏观工作区域的平面和曲面上开发和应用基于尖端和激光的纳米纤维。结果表明，亚10纳米结构可以通过扫描探针光刻（SPL）制造。软印模的使用揭示了它们对于弯曲表面上的纳米压印的适用性。利用405 nm激光二极管在曲面上进行抗蚀剂无掩模曝光的基于激光的方法已经成功地进行了测试。此外，目前的工作涉及双光子聚合，这对于亚波长结构的制造具有很大的潜力。目前，上述方法都只适用于平面<100 × 100 μ m ~ 2，高度<10 μm的工作范围。为了克服这些限制，纳米纤维技术现在被集成在TU Ilmenau开发的纳米定位和测量机（NPMM）中。它们提供高达200 × 200 × 25 mm 3的工作体积，定位分辨率为20 pm。为了以纳米精度访问3D空间中的任何几何元素，进一步开发了机器概念和机器人概念。由于在制造过程中的最低轨迹偏差的需求增加，新的实时控制器的探测和制造系统的调查，以及在组合力和定位传感器的相互作用。进一步的重要研究是进行干涉光刻，使非平面衬底的曝光，并在同一时间提高横向结构的分辨率。这种方法的混合和匹配的组合，允许同时曝光的大衬底区域与纳米加工方法，如SPL成为可能的NPMM的基础上，是另一个领域的巨大潜力方面的研究工作在本文中提出的。
This paper gives an overview of the research carried out at TU Ilmenau towards the development and application of tip- and laser-based nanofabrication on flat and curved surfaces in extended macroscopic working areas. It is shown that sub-10 nm structures can be fabricated by scanning probe lithography (SPL). The use of soft stamps has revealed their suitability for nanoimprinting on curved surfaces. Laser-based methods for a maskless exposure of resist on curved surfaces utilising 405 nm laser diodes have already been tested successfully. Furthermore, the current work deals with two-photon polymerisation, which has great potential with regard to the fabrication of sub-wavelength structures. At present, the methods mentioned have all been applied only in working ranges <100 × 100 μm2 in the plane and <10 μm in height. To overcome these limitations, the nanofabrication techniques are now being integrated in the nanopositioning and measuring machines (NPMMs) developed at TU Ilmenau. They offer working volumes of up to 200 × 200 × 25 mm3 with a positioning resolution of 20 pm. To provide access to any geometry elements in the 3D space with nanometre precision, the machine concepts as well as the metrological concepts are further developed. Due to the increased demands of lowest trajectory deviations within the fabrication process, new real-time controllers for probing and fabrication systems are investigated, as well as interactions in combined force and positioning sensors. Further important research is carried out into interference lithography, to enable an exposure of non-planar substrates and to improve the lateral structure resolution at the same time. A mix-and-match combination of such methods that allows the simultaneous exposure of large substrate regions with nanofabrication methods such as SPL becomes possible on the basis of the NPMMs, and is another area of great potential with regard to the research work presented in this paper.