Quantitative determination of a model organic/insulator/metal interface structure.
Quantitative determination of a model organic/insulator/metal interface structure.
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DOI:
10.1039/c8nr06387g
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发表时间:
2018-11-29
期刊:
影响因子:
6.7
通讯作者:
Auwärter W
中科院分区:
文献类型:
--
作者:
Schwarz M ;Duncan DA ;Garnica M ;Ducke J ;Deimel PS ;Thakur PK ;Lee TL ;Allegretti F ;Auwärter W
The interfaces of a prototypical organic/insulator/metal system (Co–P/h-BN/Cu(111)) are characterized quantitatively by means of XPS, XSW and STM. By combining X-ray photoelectron spectroscopy, X-ray standing waves and scanning tunneling microscopy, we investigate the geometric and electronic structure of a prototypical organic/insulator/metal interface, namely cobalt porphine on monolayer hexagonal boron nitride (h-BN) on Cu(111). Specifically, we determine the adsorption height of the organic molecule and show that the original planar molecular conformation is preserved in contrast to the adsorption on Cu(111). In addition, we highlight the electronic decoupling provided by the h-BN spacer layer and find that the h-BN–metal separation is not significantly modified by the molecular adsorption. Finally, we find indication of a temperature dependence of the adsorption height, which might be a signature of strongly-anisotropic thermal vibrations of the weakly bonded molecules.
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