Quantitative determination of a model organic/insulator/metal interface structure.

Quantitative determination of a model organic/insulator/metal interface structure.
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DOI:
10.1039/c8nr06387g
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发表时间:
2018-11-29
期刊:
影响因子:
6.7
通讯作者:
Auwärter W
Auwärter W
中科院分区:
材料科学2区
文献类型:
--
作者:
Schwarz M ;Duncan DA ;Garnica M ;Ducke J ;Deimel PS ;Thakur PK ;Lee TL ;Allegretti F ;Auwärter W

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利用XPS、XSW和STM对典型的有机/绝缘体/金属体系(Co-P/h-BN/Cu(111))的界面进行了定量表征。利用X射线光电子能谱、X射线驻波和扫描隧道显微镜研究了典型的有机/绝缘体/金属界面,即钴卟啉/单层六方氮化硼(h-BN)/Cu(111)界面的几何结构和电子结构.具体来说,我们确定的吸附高度的有机分子,并表明,原来的平面分子构象被保存在Cu(111)上的吸附相反。此外,我们强调的h-BN间隔层提供的电子去耦,并发现h-BN-金属分离没有显着修改的分子吸附。最后,我们发现的吸附高度,这可能是强各向异性的弱键合分子的热振动的签名的温度依赖性的指示。
The interfaces of a prototypical organic/insulator/metal system (Co–P/h-BN/Cu(111)) are characterized quantitatively by means of XPS, XSW and STM. By combining X-ray photoelectron spectroscopy, X-ray standing waves and scanning tunneling microscopy, we investigate the geometric and electronic structure of a prototypical organic/insulator/metal interface, namely cobalt porphine on monolayer hexagonal boron nitride (h-BN) on Cu(111). Specifically, we determine the adsorption height of the organic molecule and show that the original planar molecular conformation is preserved in contrast to the adsorption on Cu(111). In addition, we highlight the electronic decoupling provided by the h-BN spacer layer and find that the h-BN–metal separation is not significantly modified by the molecular adsorption. Finally, we find indication of a temperature dependence of the adsorption height, which might be a signature of strongly-anisotropic thermal vibrations of the weakly bonded molecules.
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