Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer
Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer
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DOI：
10.1039/b315278b
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发表时间：
2004-04-07
影响因子：
4.9
通讯作者：
Ohdomari, I
中科院分区：
文献类型：
--
作者：
Zhang, GJ;Tanii, T;Ohdomari, I
通过电子束光刻在硅表面的十八烷基三甲氧基硅烷自组装单层膜上产生修饰的寡核苷酸的纳米级图案。通过落射荧光显微镜检测具有250 nm量级的特征尺寸的DNA结构。
Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epifluorescence microscopy.