Improvement of acid resistance of Zn-doped dentin by newly generated chemical bonds

Improvement of acid resistance of Zn-doped dentin by newly generated chemical bonds
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DOI:
10.1016/j.matdes.2022.110412
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发表时间:
2022-02-04
期刊:
影响因子:
8.4
通讯作者:
Hayashi, Mikako
Hayashi, Mikako
中科院分区:
材料科学1区
文献类型:
--
作者:
Naito, Katsuaki;Kuwahara, Yasutaka;Hayashi, Mikako

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龋齿是世界上最流行的传染病,是由氢氧根离子扩散到牙齿结构中引起的。为了预防龋齿,将氟(F)和锌(Zn)离子应用于牙齿表面是潜在的有效措施。本研究采用X射线/γ射线发射、X射线衍射、X射线光电子能谱和X射线吸收光谱等方法研究了离子对牙本质抗酸性的影响,特别是F和Zn的化学键对牙本质抗酸性的影响。结果表明,锌元素主要分布在牙本质表层,而不改变牙本质的晶体结构。从Zn K边扩展的X射线吸收精细结构,锌纳入牙本质是由氧包围,并表现出四重配位。Zn掺杂牙本质中Zn-O键长和化学状态的变化表明,新生成的Zn-O共价键可能提高牙本质的抗酸性。本研究表明,原子和分子结构,如分子距离和化学状态,影响牙齿的耐酸性,强调化学状态分析的有效性,了解生物材料的性能。(c)2022作者。由爱思唯尔有限公司出版。这是一篇开放获取的文章,使用CC BY许可证(http://creativecommons.org/licenses/by/4.0/)。
Dental caries, the world's most prevalent infectious disease, is caused by the diffusion of hydroxyl ions into tooth structures. To prevent dental caries, the application of fluoride (F) and zinc (Zn) ions to teeth surfaces are potential effective measures. In this study, The ionic influence, especially the chemical bond of F and Zn, on the acid resistance of dentin were investigated by particle induced X-ray / gamma-ray emission, X-ray diffraction, X-ray photoelectron spectroscopy and X-ray absorption spectroscopy. The results showed Zn was distributed in the limited surface layer of dentin without altering its crystal structure. From the Zn K edge extended X-ray absorption fine structure, Zn incorporated into dentin was surrounded by oxygen and demonstrated four-fold coordination. The bond length and chemical state of Zn-O in Zn doped dentin suggested newly generated Zn-O covalent bond, which may improve acid resistance of dentin. This study showed that the atomic and molecular structures, such as the molecular distances and chemical state, influenced acid resistance of teeth, emphasizing the validity of chemical state analysis for understanding properties in biomaterials. (c) 2022 The Author(s). Published by Elsevier Ltd. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).