Strain relaxation and vacancy creation in thin platinum films.
Strain relaxation and vacancy creation in thin platinum films.
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铂薄膜中的应变松弛和空位产生。
DOI：
10.1103/physrevlett.107.265501
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发表时间：
2011
影响因子：
8.6
通讯作者：
Harald Schmidt
中科院分区：
文献类型：
--
作者：
W. Gruber;Sujay Chakravarty;Carsten Baehtz;W. Leitenberger;Michael Bruns;A. Kobler;Christian Kübel;Harald Schmidt
利用同步辐射原位X射线衍射和反射测量相结合的方法研究了空位对金属Pt薄膜中残余应力松弛的作用。从实验确定的晶格参数a和膜厚度L的相对变化，导出空位浓度和残余应变的修改作为在130 °C下退火时间的函数。结果表明，由压应力引起的应变松弛伴随着自由膜表面空位的产生。这证明了实验上的假设占主导地位的作用，空位应力松弛的金属薄膜接近室温。
Synchrotron based combined in situ x-ray diffractometry and reflectometry is used to investigate the role of vacancies for the relaxation of residual stress in thin metallic Pt films. From the experimentally determined relative changes of the lattice parameter a and of the film thickness L the modification of vacancy concentration and residual strain was derived as a function of annealing time at 130 °C. The results indicate that relaxation of strain resulting from compressive stress is accompanied by the creation of vacancies at the free film surface. This proves experimentally the postulated dominant role of vacancies for stress relaxation in thin metal films close to room temperature.