Electron-Beam-Induced Decomposition Mechanisms of High-Sensitivity Chlorinated Resist ZEP520A
Electron-Beam-Induced Decomposition Mechanisms of High-Sensitivity Chlorinated Resist ZEP520A
复制标题
高灵敏度氯化光刻胶ZEP520A的电子束诱导分解机制
DOI：
10.1143/apex.5.036501
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发表时间：
2012
影响因子：
2.3
通讯作者：
et al
中科院分区：
文献类型：
--
作者：
Tomoko Gowa Oyama;et al
ZEP520A（α-氯甲基丙烯酸酯和α-甲基苯乙烯的1:1共聚物，ZEON）是一种用于电子束（EB）光刻的主链断裂型正性抗蚀剂，以其高灵敏度和高分辨率而闻名。本研究使用100 kV EB辐照ZEP520A，并通过凝胶渗透色谱、傅里叶变换红外光谱、核磁共振光谱和脉冲放射分解分析其分解机理。证实氯很容易解离为 Cl-离子（解离电子附着，DEA），并且 ZEP520A 发生 β 断裂。主链断裂可以考虑多种通道，包括 DEA 和苯基自由基阳离子与 Cl-离子之间的电荷转移络合物。
ZEP520A (1: 1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl-ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl-ions.