Calibration and standards beamline 6.3.2 at the Advanced Light Source

Calibration and standards beamline 6.3.2 at the Advanced Light Source
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高级光源处的校准和标准光束线 6.3.2

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发表时间:
1996
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通讯作者:
W. Steele
W. Steele
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文献类型:
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作者:
J. Underwood;E. Gullikson;M. Koike;P. Batson;P. Denham;K. Franck;R. Tackaberry;W. Steele

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这条偏转磁铁光束线自1995年2月以来一直在运行,用于光学元件(反射镜、光栅、多层膜、探测器等)的表征。能量范围为50-1000 eV。虽然它主要是为EUV投影光刻的多层反射光学器件的精密反射测量而设计的,但它具有广泛的测量能力。光学系统由单色仪、反射计和重聚焦镜组成,以在样品上提供小光斑。单色器是一种非常紧凑的、无入口狭缝的、可变线间距的平面光栅设计,其中机械刻划光栅在高度缩小的球面镜的会聚光中工作。反射镜的像差通过线间距变化来校正,使得光谱分辨率λ/Δλ被ALS源尺寸限制为约7000。波长扫描是通过简单的旋转光栅与一个固定的出口狭缝。该反射计具有定位的能力,...
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