Investigation and process control of the grating fill-factor and sidewall angle impacts on 2-D metamaterial infrared mirrors
Investigation and process control of the grating fill-factor and sidewall angle impacts on 2-D metamaterial infrared mirrors
复制标题
DOI：
10.1364/ome.471630
复制
发表时间：
2022
影响因子：
2.8
通讯作者：
Lorenzo Faraone
中科院分区：
文献类型：
--
作者：
Haifeng Mao;Xianshan Dong;Yihui Liu;K. K. M. B. Dilusha Silva;Lorenzo Faraone
We report the first study of the effects of grating fill-factor variation and sidewall angle on 2-D subwavelength grating shortwave infrared mirrors, and the first development of a geometry compensation approach to correct for the grating fill-factor patterning error caused by EBL proximity effect and a plasma etching process based on CHF3 passivation to control grating sidewall angle. Mirrors with a large grating air-hole diameter-to-pitch ratio of 0.954 and vertical sidewall angle of 89.8° are demonstrated with an average reflectivity of 99% over an ultrabroad wavelength range of 560 nm (1.92-2.48 µm), which represents an unprecedented fractional bandwidth of 26%.
