Surface Modification by Ion Implantation to Improve the Oxidation Resistance of Materials for High Temperature Technology

Surface Modification by Ion Implantation to Improve the Oxidation Resistance of Materials for High Temperature Technology
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离子注入表面改性提高高温技术材料的抗氧化能力

DOI:
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发表时间:
2012
期刊:
影响因子:
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通讯作者:
M. Schütze
M. Schütze
中科院分区:
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文献类型:
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作者:
H. Zschau;M. Schütze

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钛铝金属间化合物在高温技术中具有很大的应用潜力。它们在700°C以上温度下的高比强度为制造航空航天和汽车工业部件提供了可能性。TiAl的比重仅为广泛使用的镍基高温合金的50%,非常适合用于快速旋转部件,如飞机发动机和陆地发电站中的涡轮机叶片、排气阀或涡轮增压器转子。因此,期望更低的机械应力和减少的燃料消耗。与这些益处相反,TiAl在高于750°C的温度下显示出不足的抗氧化性(Rahmel等人,1995年)。为了达到更高的工作温度,需要保护性氧化铝氧化皮。表面改性可避免对材料的优异机械性能产生任何不利影响。通过使用“卤素效应”,在用少量氯掺杂金属表面后形成致密的保护性氧化铝氧化皮(Kumagai等人,1996; Schütze & Hald,1997; Donchev等人,2003; Schumacher等人,1999 a; Schumacher等人,1999 b; Hornauer等人,1999年)。卤素效应可以通过热力学模型来解释,该热力学模型假设挥发性卤化铝优选形成并通过金属/氧化物界面内的孔和微裂纹运输,并且它们转化成氧化铝,从而在表面上形成保护性氧化皮(Donchev等人,2003年)。然而,铝氧化膜失败,在热循环加载的Cl-注入的TiAl样品。基于该模型,对氟和TiAl进行了综合计算,预测了积极的影响。化学计算的结果必须转换成F-浓度。由于束线离子注入的准确性和可重复性,选择束线离子注入作为F施加的方法。通过改变注入参数,必须确定最佳条件,以满足正F效应所需的F量区域。注入的F-深度分布可以通过非破坏性离子束分析方法PIGE(质子诱导伽马射线发射)进行验证。通过F-效应形成的氧化铝垢即使在热循环条件下也是粘附的。然而,只有当氟效应可以稳定至少1000小时的时间时,技术应用才是可能的。因此,在氧化铝氧化皮形成之后,氧化保护的稳定性取决于注入的氟相对于未注入的氟的行为。
The intermetallic Titaniumaluminides are expected to have a high potential as material in high temperature technology. Their high specific strength at temperatures above 700°C offers the possibility for manufacturing components of aerospace and automotive industries. With a specific weight of 50% of that of the widely used Ni-based superalloys TiAl is very suitable for fast rotating parts like turbine blades in aircraft engines and land based power stations, exhaust valves or turbocharger rotors. Thus lower mechanical stresses and a reduced fuel consumption are expected. In contrast to these benefits TiAl shows insufficient oxidation resistance at temperatures above 750°C (Rahmel et al., 1995). To reach higher service temperatures a protective alumina scale would be needed. A surface modification avoids any detrimental influence on the excellent mechanical properties of the material. By using the “halogen effect” a dense protective alumina scale was formed after doping the metal surface with small amounts of chlorine (Kumagai et al., 1996; Schütze & Hald, 1997; Donchev et al., 2003; Schumacher et al., 1999a; Schumacher et al., 1999b; Hornauer et al., 1999). The halogen effect can be explained by a thermodynamic model assuming the preferred formation and transport of volatile Alhalides through pores and microcracks within the metal/oxide interface and their conversion into alumina, forming a protective oxide scale on the surface (Donchev et al., 2003). However the alumina scale fails during thermocyclic loading of Cl-implanted TiAlsamples. Based on this model comprehensive calculations have been performed for fluorine and TiAl predicting a positive effect. The results of thermodynamical calculations have to be transformed into F-concentrations. The beam line ion implantation is chosen as a method of F-application because of its accuracy and reproducibility. By varying the implantation parameters optimal conditions have to be determined to meet the region of F-amounts necessary for a positive F-effect. The implanted F-depth profiles can be verified by the non-destructive ion beam analysis method PIGE (Proton Induced Gamma-ray Emission). The alumina scale formed via the F-effect is adherent even under thermocyclic conditions. However technical use is only possible if the fluorine effect can be stabilized for a time of at least 1000 hours. Hence after the alumina scale formation the stability of oxidation protection depends on the behaviour of the implanted fluorine vs.
DOI: 10.3184/096034009x440245
发表时间: 2009
影响因子: 1.3
作者:
H.-E. Zschau;D. Renusch;P. Masset;M. Schütze
通讯作者: M. Schütze