Effect of plasma density on the distribution of incident ions and depth profile in plasma-based ion implanted layers
Effect of plasma density on the distribution of incident ions and depth profile in plasma-based ion implanted layers
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DOI：
10.1016/s0169-4332(02)01116-9
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发表时间：
2003-02
影响因子：
6.7
通讯作者：
S. Qi;X. Lifang;Ma Xinxin;Sun Mingren
中科院分区：
文献类型：
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作者：
S. Qi;X. Lifang;Ma Xinxin;Sun Mingren
