Machine-learning for designing nanoarchitectured materials by dealloying
Machine-learning for designing nanoarchitectured materials by dealloying
复制标题
DOI:
10.1038/s43246-022-00303-w
复制
发表时间:
2022-11
影响因子:
7.8
通讯作者:
Chonghang Zhao;Cheng‐Chu Chung;Siying Jiang;M. Noack;Jiun-Han Chen;Kedar Manandhar;J. Lynch;Hui Zhong;wei zhu;Phillip M. Maffettone;D. Olds;M. Fukuto;Ichiro Takeuchi;S. Ghose;T. Caswell;K. Yager;Y. K. Chen‐Wiegart
中科院分区:
文献类型:
--
作者:
Chonghang Zhao;Cheng‐Chu Chung;Siying Jiang;M. Noack;Jiun-Han Chen;Kedar Manandhar;J. Lynch;Hui Zhong;wei zhu;Phillip M. Maffettone;D. Olds;M. Fukuto;Ichiro Takeuchi;S. Ghose;T. Caswell;K. Yager;Y. K. Chen‐Wiegart
Machine learning-augmented materials design is an emerging method for rapidly developing new materials. It is especially useful for designing new nanoarchitectured materials, whose design parameter space is often large and complex. Metal-agent dealloying, a materials design method for fabricating nanoporous or nanocomposite from a wide range of elements, has attracted significant interest. Here, a machine learning approach is introduced to explore metal-agent dealloying, leading to the prediction of 132 plausible ternary dealloying systems. A machine learning-augmented framework is tested, including predicting dealloying systems and characterizing combinatorial thin films via automated and autonomous machine learning-driven synchrotron techniques. This work demonstrates the potential to utilize machine learning-augmented methods for creating nanoarchitectured thin films.