Dynamic corrosion of Al2O3-ZrO2-SiO2 and Cr2O3-containing refractories by molten frits. Part II: Microstructural study

Dynamic corrosion of Al2O3-ZrO2-SiO2 and Cr2O3-containing refractories by molten frits. Part II: Microstructural study
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DOI:
10.1016/j.jeurceramsoc.2010.11.024
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发表时间:
2011-05-01
影响因子:
5.7
通讯作者:
Baudin, C.
Baudin, C.
中科院分区:
材料科学1区
文献类型:
--
作者:
Pena, P.;Criado, E.;Baudin, C.

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在这项工作中,描述了通过两种结晶(透明)熔块对熔铸 Al2O3-SiO2-ZrO2 和等静压烧结 Cr2O3 基耐火材料进行动态腐蚀研究的结果。使用“旋转木马”测试在 1500 摄氏度的温度下进行了实验。通过反射光学显微镜和扫描电子显微镜以及 X 射线色散能量分析,对所研究的耐火材料腐蚀区域的选定区域进行了微观结构和矿物学分析。发现了两种材料的腐蚀机制之间存在显着差异。在熔铸 Al2O3-SiO2-ZrO2 样品中,腐蚀是由于玻璃料中的氧化铝和氧化锆以及玻璃料与耐火材料反应形成的玻璃中的氧化铝和氧化锆溶解而发生的。在 Cr2O3 基材料中,腐蚀过程由熔融玻璃料通过开孔的毛细管渗透来控制。玻璃料中的 ZnO 与 Cr2O3 之间的反应导致形成尖晶石 (ZnCr2O4),这是一种高熔点键合相,可阻碍玻璃料的渗透。使用相关相平衡图讨论结果。 (c) 2010 Elsevier Ltd. 保留所有权利。
In this work results on dynamic corrosion studies of fused cast Al2O3-SiO2-ZrO2 and isostatically pressed and sintered Cr2O3-based refractories by two crystalline (transparent) frits are described. Experiments have been performed using the "Merry Go Round" test at congruent to 1500 degrees C.Microstructural and mineralogical analyses of selected areas from the corroded regions of the studied refractories were performed by reflected light optical microscopy and scanning electron microscopy with analysis by X-ray dispersive energy.Significant differences between the corrosion mechanisms acting in the two types of materials were found. In the fused cast Al2O3-SiO2-ZrO2 specimens corrosion took place by the dissolution of alumina and zirconia in the frit and in the glass formed by the reaction between the frit and the refractory. In the Cr2O3-based materials the corrosion process was controlled by the capillar penetration of the molten frit through the open pores. The reaction between the ZnO from the frits and Cr2O3 led to the formation of spinet (ZnCr2O4), a high-melting point bonding phase that retarded the frit penetration. Results are discussed using the relevant phase equilibrium diagrams. (c) 2010 Elsevier Ltd. All rights reserved.