Surface modification of Y3Al5O12:Ce3+ phosphor by hydrofluoric acid wet etching
Surface modification of Y3Al5O12:Ce3+ phosphor by hydrofluoric acid wet etching
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DOI：
10.1016/j.jlumin.2012.12.010
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发表时间：
2013-04
影响因子：
3.6
通讯作者：
Z. He;Wei-zhuang Cheng;Zebin Li;Y. Liu;Q. Ou;Rongqing Liang
中科院分区：
文献类型：
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作者：
Z. He;Wei-zhuang Cheng;Zebin Li;Y. Liu;Q. Ou;Rongqing Liang
采用氢氟酸湿法刻蚀对固相反应法制备的Y3Al5O12：Ce3+荧光粉进行表面改性。SEM照片表明，改性后的荧光粉颗粒表面变得光滑，XRD谱图表明，改性后的荧光粉颗粒表面结晶度提高。因此，从荧光粉颗粒的光致发光发射与光滑的表面呈现出更高的量子产率（增加了5.5%）比没有修改，和更低的背散射光由光滑的荧光粉颗粒也被发现，这表明更好的光吸收，透明度和结晶度的表面特性。
The surface of Y3Al5O12:Ce3+phosphor prepared by solid-state reaction was modified by hydrofluoric acid wet etching. The SEM pictures show that the edge-angles-rich surface of the phosphor particles becomes smooth and the XRD spectra show that the surface crystallinity is improved after modification for more than 3h. Consequently, the photoluminescence emission from phosphor particles with smooth surface presents a higher quantum yield (increased by 5.5%) than that without modification, and a lower backscattering light by the smoothed phosphor particles is also found, which suggests better surface characteristics of light absorption, transparency and crystallinity.