XPS and UPS study of Na deposition on thin film V2O5
XPS and UPS study of Na deposition on thin film V2O5
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DOI：
10.1016/j.apsusc.2005.03.134
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发表时间：
2005-12-15
影响因子：
6.7
通讯作者：
Jaegermann, W
中科院分区：
文献类型：
--
作者：
Wu, QH;Thissen, A;Jaegermann, W
利用光电子能谱研究了钠在五氧化二钒薄膜上的沉积。由于钠的沉积，钒离子被强烈还原。在表面观察到三种钠物种：第一种归属于嵌入的钠；第二种归因于过氧化钠；第三种归为金属钠。过氧化钠的形成导致在价带光谱中约10.3 eV处出现一条发射线。在超高真空室中，金属钠将进一步与氧化物基底反应并在表面形成过氧化钠。（c）2005爱思唯尔有限公司。版权所有。
The deposition of Na on thin film V2O5 has been study by using photoelectron spectroscopy. Vanadium ions are strongly reduced due to the deposition of Na. Three kinds of Na species were observed on the surface: the first is assigned to intercalated Na; the second is contributed to Na2O2; the third is appointed to metallic Na. The formation of Na2O2 leads to arise an emission line at about 10.3 eV in the valence band spectra. The metallic Na will further react with the oxides substrate and form Na2O2 on the surface in UHV chamber. (c) 2005 Elsevier B.V. All rights reserved.