A combined laboratory and synchrotron in-situ photoemission study of the rutile TiO 2 (110)/water interface
A combined laboratory and synchrotron in-situ photoemission study of the rutile TiO 2 (110)/water interface
复制标题
金红石 TiO 2 (110)/水界面的实验室和同步加速器原位光电子发射联合研究
DOI：
10.1088/1361-6463/abddfb
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发表时间：
2021
期刊：
影响因子：
--
通讯作者：
Byrne C
中科院分区：
文献类型：
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作者：
Byrne C
在实验室系统（NAP-cell配置）和同步加速器终端站（回填配置）中通过近环境压力-X射线光电子能谱（NAP-XPS）对TiO 2/水界面进行了原位分析。如NAP-XPS、原位样品温度和背景蒸汽压监测所示，在金红石型TiO 2表面上形成了超薄液态水润湿层（~ 10 nm），除了在液膜生长过程中具有独特的洞察力外，还存在最少的污染。固/液界面处的化学变化也通过Ti 3+表面缺陷态的愈合来证明。生长的液体层的光子深度分布表明，所形成的膜是超薄的（约10 nm），并可能是连续的性质。这项工作展示了一种新的和灵活的方法，通过NAP-XPS研究固/液界面，它很容易与任何形式的NAP-XPS系统集成，从而使一个关键的研究界面提供给广大观众的研究人员用于操作电化学和光催化研究。
In-situ analysis of the TiO 2/water interface via near ambient pressure–x-ray photoelectron spectroscopy (NAP–XPS) is demonstrated in both a lab based system (NAP-cell configuration) and synchrotron endstation (backfill configuration). Ultra-thin wetting layers of liquid water (∼ 10 nm) are formed on a rutile TiO 2 surface with minimal contamination present in addition to unique insight during the growth of the liquid films as indicated via NAP–XPS, in-situ sample temperature and background vapour pressure monitoring. Chemical changes at the solid/liquid interface are also demonstrated via healing of Ti 3+ surface defect states. Photon depth profiling of the as grown liquid layers indicate that the formed films are ultra-thin (∼ 10 nm) and likely to be continuous in nature. This work demonstrates a novel and flexible approach for studying the solid/liquid interface via NAP–XPS which is readily integrated with any form of NAP–XPS system, thereby making a critical interface of study available to a wide audience of researchers for use in operando electrochemical and photocatalytic research.