Photochemical treatment of transition metal substituted disilanes, (.eta.5-C5H5)Fe(CO)2Si2Me4(C6H4X) (X = Cl, CF3, NMe2, OMe, H), including trapping of expelled silylene

Photochemical treatment of transition metal substituted disilanes, (.eta.5-C5H5)Fe(CO)2Si2Me4(C6H4X) (X = Cl, CF3, NMe2, OMe, H), including trapping of expelled silylene
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过渡金属取代乙硅烷 (.eta.5-C5H5)Fe(CO)2Si2Me4(C6H4X) (X = Cl、CF3、NMe2、OMe、H) 的光化学处理,包括捕获排出的硅烯

DOI:
10.1021/ja00077a036
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发表时间:
1993
影响因子:
15
通讯作者:
K. Pannell
K. Pannell
中科院分区:
化学1区
文献类型:
--
作者:
Karen L. Jones;K. Pannell

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A series of complexes (η 5 -C 5 H 5 )Fe(CO) 2 Si 2 Me 4 Ar, FpSi 2 Me 4 Ar (Ar= C 6 H 4 ; X=H, p-Cl, m-CF 3 , o-Me, p-OMe, p-NMe 2 ), have been synthesized and characterized. Photochemical treatment of the complexes in inert hydrocarbon solvents led to expulsion of the SiMe 2 and/or SiMeAr fragments to yield FpSiMe 3 and /or FpSiMe 2 Ar