Nano-textured polymer surfaces with controlled wetting and optical properties using plasma processing
Nano-textured polymer surfaces with controlled wetting and optical properties using plasma processing
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DOI：
10.1504/ijnt.2009.021716
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发表时间：
2009
影响因子：
0.5
通讯作者：
N. Vourdas;M. Vlachopoulou;A. Tserepi;E. Gogolides
中科院分区：
文献类型：
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作者：
N. Vourdas;M. Vlachopoulou;A. Tserepi;E. Gogolides
湿控制在许多应用中非常重要，从防水表面的制造到微流体中的液滴无摩擦运动，以及生物相容性调整。润湿或排斥行为受表面化学和形貌的控制。特别地，通过将高纵横比（HAR）几何特征与低表面能涂层相结合来获得超疏水性。在这项研究中，我们继续我们的研究工作，有关一种新的，简单的，通用的和快速的技术，制造稳定的超疏水性，但透明的表面，通过高密度等离子体蚀刻和沉积。高密度等离子体反应器用于处理两种不同类型的聚合物;有机聚合物（PMMA）和混合聚合物（PDMS）。实施特定于每种聚合物的不同等离子体化学以蚀刻表面，然后进行氟碳化合物沉积以分别控制表面粗糙度和表面化学。AFM用于表征形貌，水接触角测量用于表征润湿性能。我们展示了高纵横比的支柱，高度范围从约。取决于加工时间，接触角为350 nm至几微米，接触角为150°，滞后小于10°。柱短于400 nm的表面同时是透明的。
Wettability control is of great importance in many applications, from manufacturing of water repellent surfaces to droplet frictionless motion in microfluidics, and biocompatibility tuning. Wetting or repellent behaviour is governed by both surface chemistry and topography. In particular, super-hydrophobicity is attained by combining high-aspect-ratio (HAR) geometrical characteristics with low surface energy coatings. In this study we continue our research efforts pertaining a novel, simple, generic and fast technique to fabricate stable super-hydrophobic, yet transparent surfaces by means of high-density plasma etching and deposition. A High Density Plasma reactor is used to treat two different kind of polymers; an organic one (PMMA) and a hybrid one (PDMS). Different plasma chemistries specific to each polymer are implemented to etch the surfaces followed by a fluorocarbon deposition to control the surface roughness and the surface chemistry respectively. AFM is used to characterise morphology and water contact angle measurements to characterise wetting properties. We demonstrate high aspect ratio pillars with height ranging from ca. 350 nm to several microns depending on the processing time, and contact angles of 150° with hysteresis lower than 10°. Surfaces with pillars shorter than 400 nm are simultaneously transparent.