Digital and Gradient Refractive Index Planar Optics by Nanoimprinting Mesoporous Silicon
Digital and Gradient Refractive Index Planar Optics by Nanoimprinting Mesoporous Silicon
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DOI：
10.1002/adom.202201597
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发表时间：
2022-11-10
影响因子：
9
通讯作者：
Ryckman，Judson D.
中科院分区：
文献类型：
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作者：
Hardison，Anna L.;Talukdar，Tahmid H.;Ryckman，Judson D.
报道了将纳米压痕折射率(NIRI)技术应用于介孔硅实现数字和梯度折射率平板光学和平面光波导。这种技术结合了介孔硅独特的光学和机械超材料特性，包括其可广泛调节的有效折射率和在接近零泊松比的情况下进行塑性变形的能力。利用预制版和可重复使用的包含模拟或数字特征的邮票进行纳米压印，可以连续或不连续地绘制具有高对比度Δn≥0.8和亚波长分辨率的折射率图案化。利用NIRI，我们实验证明了一种在可见光(405-635 nm)和介孔硅和二氧化硅波导中工作在1310 nm附近的波前整形平板微透镜阵列。这项研究证明了在芯片表面构图任意折射率分布n(x，y)的可行性，同时绕过了自上而下光刻技术的挑战和限制-从而为实现先进的平面光学技术开辟了一种低成本和可扩展的方法。
We report the realization of digital and gradient index flat‐optics and planar waveguides using the ‘nanoimprinting refractive index’ (NIRI) technique applied to mesoporous silicon. This technique combines the distinct optical and mechanical metamaterial qualities of mesoporous silicon, including its widely tunable effective refractive index and ability to undergo plastic deformation with a near zero Poisson ratio. Nanoimprinting with premastered and reusable stamps containing analog or digital features enables the continuous or discontinuous patterning of refractive index with high contrast Δn≥ 0.8 and subwavelength resolution. Using NIRI we experimentally demonstrate a wavefront shaping flat microlens array operating in the visible (405–635 nm) and mesoporous silicon and silica waveguides operating near 1310 nm. This study demonstrates the viability of patterning arbitrary refractive index distributions,n(x,y), on the surface of a chip while circumventing the challenges and limitations of top‐down lithographic techniques – thus opening a low‐cost and scalable approach for the realization of advanced planar optical technologies.