Cathode Current Density Distributions in High Power Impulse and Direct Current Magnetron Sputtering Modes
Cathode Current Density Distributions in High Power Impulse and Direct Current Magnetron Sputtering Modes
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DOI：
10.1002/ppap.200931201
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发表时间：
2009-06
影响因子：
3.5
通讯作者：
G. Clarke;A. Mishra;P. Kelly;J. Bradley
中科院分区：
文献类型：
--
作者：
G. Clarke;A. Mishra;P. Kelly;J. Bradley
在高功率脉冲磁控溅射放电过程中，可以观察到超过1 000 A的峰值电流，导致大的瞬时功率水平。为了研究这种操作方法，已经构建了一系列平面探针，其允许评估跨阴极表面的电流的空间和时间变化。这些测量提供了关于在阴极被溅射时带电粒子进出阴极的通量的信息。在导致峰值电流为140 A的操作条件下，测得的电流密度在空间上从0.1 A· cm-2变化到1.5 A · cm-2。通过使用一个简单的模型，测得的电流密度被用来预测阴极的溅射速率，这允许的侵蚀轮廓和目标寿命被估计。结果表明，关于溅射，在HiPIMS模式下操作可能比在DC模式下操作的能量效率低，但可以实现更高的靶利用率。
During the operation of high power impulse magnetron sputtering discharges, peak currents in excess of 1 000 A may be observed, leading to large instantaneous power levels. To investigate this method of operation, a series of planar probes have been constructed that allow for the spatial and temporal variations of current across the surface of a cathode to be assessed. These measurements provide information on the flux of charged particles to and from the cathode whilst it is being sputtered. Under operating conditions that led to a peak current of 140 A, measured current densities varied spatially from 0.1 to 1.5 A · cm-2. By the use of a simple model, the measured current densities were used to predict the sputtering rate of the cathode, which allowed for the erosion profile and target lifetime to be estimated. The results suggest that, with regard to sputtering, operating in HiPIMS mode may be less energy efficient than operating in DC mode, but may achieve a higher target utilisation fraction.