Properties of CrN/TiN Multilayer Films With Nanoscale Layer Thickness
Properties of CrN/TiN Multilayer Films With Nanoscale Layer Thickness
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DOI：
10.1109/tps.2022.3185148
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发表时间：
2023-02
影响因子：
1.5
通讯作者：
Takashi Kimura;Hiroki Maeda
中科院分区：
文献类型：
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作者：
Takashi Kimura;Hiroki Maeda
采用反应性大功率脉冲磁控溅射和脉冲磁控溅射相结合的方法制备了纳米层厚的氮化铬(CrN)/氮化钛（TiN）多层膜。通过控制各沉积时间来调节各层厚度。采用纳米压痕技术测量的多层膜的硬度和杨氏模量随层厚的变化不显著。薄膜硬度在22 ~ 24.5 GPa之间，杨氏模量在300 ~ 330 GPa之间。相反，随着TiN层厚度的增加，多层膜的压应力逐渐减小。多层膜的摩擦系数与CrN层厚度无关，但在TiN层厚度小于2 nm的范围内，随着TiN层厚度的增加，摩擦系数急剧降低至0.2 ~ 0.3。
Chromium nitride (CrN)/titanium nitride (TiN) multilayer films at nanoscale layer thickness were prepared using a combination of reactive high-power impulse magnetron sputtering (HiPIMS) and pulsed magnetron sputtering. Each layer thickness was adjusted by controlling each deposition time. The hardness and Young’s modulus of the multilayer films, which were measured using nanoindentation technique, did not vary significantly with layer thickness. The film hardness ranged between 22 and 24.5 GPa, and the Young modulus was between 300 and 330 GPa. On the contrary, the compressive stress of the multilayer films gradually decreased with the increase in the TiN layer thickness. The friction coefficient of the multilayer film did not depend on the CrN layer thickness, but it reduced drastically to 0.2–0.3 with the increase in the TiN layer thickness in the range of the TiN layer thickness less than about 2 nm.