Subtractive Patterning via Chemical Lift-Off Lithography
Subtractive Patterning via Chemical Lift-Off Lithography
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DOI：
10.1126/science.1221774
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发表时间：
2012-09-21
期刊：
影响因子：
56.9
通讯作者：
Andrews, Anne M.
中科院分区：
文献类型：
--
作者：
Liao, Wei-Ssu;Cheunkar, Sarawut;Andrews, Anne M.
涉及将分子“油墨”从聚合物印模转移到基底的常规软光刻方法由于在印刷期间转移的分子的扩散而经常遇到微米级分辨率限制。我们报告了一个“减法”冲压过程中，硅橡胶邮票，氧等离子体激活，选择性地删除羟基封端的烷硫醇自组装单分子膜（SAM）的黄金表面具有高的图案保真度。在压模-衬底界面处形成的共价相互作用足够强，不仅可以从衬底上除去烷醇分子，而且可以除去金原子。制造了各种高分辨率的图案化特征，并且印模被清洁和重复使用多次而没有特征劣化。剩余的SAM充当用于蚀刻暴露的金特征的抗蚀剂。单层膜进入剥离区域使图案化的蛋白质捕获成为可能，并实现了40纳米的化学图案。
Conventional soft-lithography methods involving the transfer of molecular "inks" from polymeric stamps to substrates often encounter micrometer-scale resolution limits due to diffusion of the transferred molecules during printing. We report a "subtractive" stamping process in which silicone rubber stamps, activated by oxygen plasma, selectively remove hydroxyl-terminated alkanethiols from self-assembled monolayers (SAMs) on gold surfaces with high pattern fidelity. The covalent interactions formed at the stamp-substrate interface are sufficiently strong to remove not only alkanethiol molecules but also gold atoms from the substrate. A variety of high-resolution patterned features were fabricated, and stamps were cleaned and reused many times without feature deterioration. The remaining SAM acted as a resist for etching exposed gold features. Monolayer backfilling into the lift-off areas enabled patterned protein capture, and 40-nanometer chemical patterns were achieved.