Microstructures and multiferroic properties of textured Bi0.8La0.2FeO3 thin films
Microstructures and multiferroic properties of textured Bi0.8La0.2FeO3 thin films
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DOI：
10.1016/j.apsusc.2008.04.082
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发表时间：
2008-08
影响因子：
6.7
通讯作者：
Yi Zhang;Ling-Hua Pang;Ming-Hui Lu;Z. Gu;Shantao Zhang;Changsheng Yuan;Yan-feng Chen
中科院分区：
文献类型：
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作者：
Yi Zhang;Ling-Hua Pang;Ming-Hui Lu;Z. Gu;Shantao Zhang;Changsheng Yuan;Yan-feng Chen
采用脉冲激光沉积的方法在铂/钛/二氧化硅/硅衬底上制备了La掺杂的BiFeO_3，Bi0.8La_(0.2)FeO_3薄膜。用X射线衍射仪和高分辨电子显微镜对薄膜的结构进行了分析。结果表明，在优化的生长条件下制备的薄膜具有(012)织构。X射线光电子能谱分析表明，在未检测到Fe2+的薄膜中，Fe离子的氧化态为Fe3+。该薄膜具有较低的漏电流和良好的介电性能。其剩余铁电极化为5.2μC/cm2，剩余磁化强度为0.0 2μB/Fe。这些结果对进一步的研究具有一定的启示意义。
La-substituted BiFeO3, Bi0.8La0.2FeO3, thin films were fabricated on Pt/Ti/SiO2/Si substrates by pulsed laser deposition. X-ray diffraction and high-resolution transmission electron microscope were used to analyze the structures of the films. The results show the films fabricated under optimized growth condition are (012) textured. X-ray photoemission spectroscopy results indicate that the oxidation state of Fe ion is Fe3+in the films without detectable Fe2+. The films show low leakage current and excellent dielectric characters. Multiferroic properties with a remnant ferroelectric polarization of 5.2μC/cm2and a remanent magnetization of 0.02μB/Fe were established. These results have some implications for further research.