Transport Coefficients of InAs Nanowires as a Function of Diameter
Transport Coefficients of InAs Nanowires as a Function of Diameter
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DOI:
10.1002/smll.200800969
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发表时间:
2009-01-01
期刊:
影响因子:
13.3
通讯作者:
Wang, Deli
中科院分区:
文献类型:
--
作者:
Dayeh, Shadi A.;Yu, Edward T.;Wang, Deli
InAs nanowires (NWs) have been the subject of intensive research recently in both synthesis [1–3] and transport [4–6] studies due to their potential for future high-speed nanoelectronic devices. Back-,[7] top-,[6, 8] and wrap-gate [9] NW fieldeffect transistors (NWFETs) have been employed to study the low-field transport properties of InAs NWs at room temperature. Among these properties, the capacitive effects of interface states on FET characteristics and parameter extraction,[10] and the field-dependent transport properties in InAs NWs [11] have been explored by us recently in the topgate geometry. Using conductive atomic force microscopy, the effects of channel-length scaling [12] and the transition from diffusive to ballistic carrier transport in InAs NWs has been identified.[13] On the other hand, systematic experimental characterization and detailed analysis of the effects of channelwidth scaling and channel dimensionality on the transport properties in NWs are still lacking. Herein, we present a comprehensive method to extract the transport coefficients in NWs as functions of their diameter and vertical (gate) and lateral (drain) fields, thus enabling consistent comparison due to their field dependence.[11] This extraction technique extends earlier studies on the variation of transport properties in NWs as functions of their diameter, which was attributed to either 1) only changes in carrier concentration (Si NWs)[14] or 2) only changes in carrier mobility (GaN NWs).[15] One-dimensional (1D) Schrö dinger–Poisson self-consistent solutions for a material structure similar to that used in our experiments, but with different InAs thicknesses, was performed to validate our experimental observations and analysis.