Mechanism of the cathode process in the electrolytic boriding in molten salts
Mechanism of the cathode process in the electrolytic boriding in molten salts
复制标题
熔盐电解硼阴极过程的机理
DOI：
10.1016/0013-4686(84)89006-4
复制
发表时间：
1984
影响因子：
6.6
通讯作者：
P. Fellner
中科院分区：
文献类型：
--
作者：
M. Makyta;K. Matiašovský;P. Fellner
采用伏安法和计时电位法，研究了LiFKFKBF4和LiFKFB2O3体系中铂电极上电解沉积硼的阴极过程机理。研究发现，在该体系中，LiFKFKBF4硼通过简单的三电子过程直接从四氟硼酸络合物阴离子中还原。在该系统中，LiFKFB2O3 硼氧化物与碱性氟化物电解质反应，形成 BF−4 阴离子和平均氧硼比为 1.66 的未指定的氧氟配合物。 BF−4 阴离子和氧氟络合物中的硼浓度之比约为 0.1。这两种电化学活性物质的硼沉积电位之间的差异约为 0.47 V，有利于 BF−4。 BF−4阴离子的扩散系数值为4.4×10−9m2s−1(700℃)。
The mechanism of the cathode process in the electrolytic deposition of boron on a platinum electrode has been investigated in the systems LiFKFKBF4and LiFKFB2O3by means of the voltametric and chronopotentiometric methods. It was found that in the system LiFKFKBF4boron is reduced directly from the tetrafluoroborate complex anion by a simple 3-electron process. In the system LiFKFB2O3boron oxide reacts with the basic fluoride electrolyte under formation of the BF−4anion and of unspecified oxofluoro complex(es) with a mean oxygen to boron ratio of 1.66. The ratio of boron concentrations in the BF−4anion and in the oxofluoro complex(es) is about 0.1. The difference between the deposition potential of boron from those two electrochemically active species is about 0.47 V in favour of BF−4. The value of the diffusion coefficient of the BF−4anion was found to be 4.4 × 10−9m2s−1(700°C).