T.Kamiya,K.Nakahata,K.Ro,C.M.Fortmann,I.Simizu: "High rates and very low temperature fabrication of polycrystalline silicon from fluorinated source gas and their transport properties"to be published in Mat. Res. Soc. Symp. Proc.. (1999)
T.Kamiya,K.Nakahata,K.Ro,C.M.Fortmann,I.Simizu: "High rates and very low temperature fabrication of polycrystalline silicon from fluorinated source gas and their transport properties"to be published in Mat. Res. Soc. Symp. Proc.. (1999)
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T.Kamiya、K.Nakahata、K.Ro、C.M.Fortmann、I.Simizu：“用氟化源气体高速率和极低温制造多晶硅及其传输特性”将发表在 Mat 上。
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