Unprecedented insertion reaction of a silylene into a B-B bond and generation of a novel borylsilyl anion by boron-metal exchange reaction of the resultant diborylsilane.
Unprecedented insertion reaction of a silylene into a B-B bond and generation of a novel borylsilyl anion by boron-metal exchange reaction of the resultant diborylsilane.
复制标题
DOI：
10.1039/b409575h
复制
发表时间：
2004-10
影响因子：
4.9
通讯作者：
T. Kajiwara;N. Takeda;T. Sasamori;N. Tokitoh
中科院分区：
文献类型：
--
作者：
T. Kajiwara;N. Takeda;T. Sasamori;N. Tokitoh
动力学稳定的二芳基亚甲硅烷基Tbt（Mes）Si：（1，Tbt = 2，4，6-三[双（三甲基硅基）甲基]苯基，Mes =均三甲苯基），由过拥挤的二硅烯Tbt（Mes）Si=Si（Mes）Tbt（2）或稳定的硅烯-异氰化物络合物（3a）热生成，被发现插入双（三甲基硅基）甲基的B-B键中（频哪醇合）二硼，B2（pin）2（4），并且所得二硼基硅烷的硼-锂交换反应得到第一硼基甲硅烷基阴离子。
A kinetically stabilized diarylsilylene, Tbt(Mes)Si: (1, Tbt = 2,4,6-tris[bis(trimethylsilyl)methyl]phenyl, Mes = mesityl), thermally generated from overcrowded disilene Tbt(Mes)Si=Si(Mes)Tbt (2) or stable silylene-isocyanide complex (3a), was found to insert into a B-B bond of bis(pinacolato)diboron, B2(pin)2 (4), and the boron-lithium exchange reaction of the resulting diborylsilane gave the first borylsilyl anion.