Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting
Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting
复制标题
分步重复紫外纳米压印脱模特性研究
DOI：
10.7567/jjap.52.06gj04
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发表时间：
2013
影响因子：
1.5
通讯作者：
S. Matsui
中科院分区：
文献类型：
--
作者：
Shuso Iyoshi;M. Okada;T. Katase;K. Tone;K. Kobayashi;Shu Kaneko;Y. Haruyama;M. Nakagawa;H. Hiroshima;S. Matsui
紫外线（UV）纳米压印包括将纳米级特征从模具转移到涂覆在基板上的紫外线固化抗蚀剂所必需的接触过程。接触过程中的脱模是缺陷的来源，也是纳米器件制造需要克服的障碍。在这项研究中，我们的目标是使用单个模具执行超过 10000 次分步重复 UV 纳米压印，跟踪脱模力和模具表面的水接触角，作为模阻/基材界面和模具降解的指示。本研究考虑了可冷凝气体、紫外线固化抗蚀剂和含氟表面活性剂。据透露，1,1,1,3,3-五氟丙烷（PFP）或HFC-245fa（通用工业名称）作为一种可冷凝气体和一种含氟表面活性剂，在最大限度地减少脱模影响方面发挥着重要作用，从而有助于延长模具寿命。添加表面活性剂的抗蚀剂在 PFP 中执行了 6500 次压印步骤。
Ultraviolet (UV) nanoimprinting includes a contact process necessary for transferring nanoscale features from a mold to a UV-curable resist coated on a substrate. The demolding that comes with the contact process is a source of defects, and an obstacle to be overcome for nanodevice fabrications. In this study, we aim to execute more than 10000 times of step-and-repeat UV nanoimprinting with a single mold, tracing demolding forces and water contact angles of the mold surface as the indication of mold-resist/substrate interface and mold degradation. A condensable gas, a UV-curable resist, and a fluorosurfactant were considered in this study. It was revealed that 1,1,1,3,3-pentafluoropropane (PFP) or HFC-245fa, which is the common industrial name, as a condensable gas and a type of fluorosurfactant played an important role in minimizing the demolding impact and thus helped in increasing mold lifetime. The surfactant-added resists performed 6500 imprinting steps in PFP.