Comparative Study of Al2O3 Optical Crystalline Thin Films Grown by Vapor Combinations of Al(CH3)3/N2O and Al(CH3)3/H2O2
Comparative Study of Al2O3 Optical Crystalline Thin Films Grown by Vapor Combinations of Al(CH3)3/N2O and Al(CH3)3/H2O2
复制标题
Al(CH3)3/N2O与Al(CH3)3/H2O2气相组合生长Al2O3光学晶体薄膜的对比研究
DOI：
10.1143/jjap.32.6137
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发表时间：
1993
期刊：
影响因子：
--
通讯作者：
M. Obara
中科院分区：
文献类型：
--
作者：
H. Kumagai;K. Toyoda;M. Matsumoto;M. Obara
我们比较了使用一氧化二氮（N2O）和过氧化氢（H2O2）作为氧化剂在数字化学气相沉积，以获得高品质的光学结晶薄膜的氧化铝。这些薄膜的光学常数和厚度的生长温度方面进行了研究，通过使用可变角度光谱椭圆偏振。
We compared the use of nitrous oxide (N2O) and hydrogen peroxide (H2O2) as the oxidant in digital chemical vapor deposition to obtain high-quality optical crystalline thin films of Al2O3. Optical constants and thicknesses of these films were investigated in terms of growth temperature, by using variable-angle spectroscopic ellipsometry.