Accurate Calibration Line for Super-Precise Coefficient of Thermal Expansion Evaluation Technology of TiO2-Doped SiO2 Ultra-Low-Expansion Glass Using the Line-Focus-Beam Ultrasonic Material Characterization System
Accurate Calibration Line for Super-Precise Coefficient of Thermal Expansion Evaluation Technology of TiO2-Doped SiO2 Ultra-Low-Expansion Glass Using the Line-Focus-Beam Ultrasonic Material Characterization System
复制标题
线聚焦束超声材料表征系统精确标定线超精密TiO2掺杂SiO2超低膨胀玻璃热膨胀系数评估技术
DOI：
10.1143/jjap.45.4511
复制
发表时间：
2006
影响因子：
1.5
通讯作者：
Kouji Suzuki
中科院分区：
文献类型：
--
作者：
M. Arakawa;J. Kushibiki;Y. Ohashi;Kouji Suzuki
我们得到了泄漏表面声波（LSAW）速度和TiO 2浓度之间的准确关系。线聚焦束超声材料表征（LFB-UMC）系统作为一种用于以极高精度评估超低膨胀玻璃的热膨胀系数（CTE）的新技术，需要这样的关系。使用市售的TiO 2-SiO2玻璃与周期性条纹，LSAW传播的平均速度平行于条纹平面在225 MHz和平均TiO 2浓度的X-射线荧光分析上的7个试样基板的表面上制备的垂直于条纹平面。获得的LSAW速度对TiO 2浓度的灵敏度为-0.0601 wt %/（m/s），并且对于±2 σ（σ：标准偏差），从LSAW速度测量分辨率±0.14 m/s估计测量分辨率为±0.0084 wt %。用于系统校准的LSAW速度为3308.18 m/s的标准TiO 2-SiO2玻璃样品的TiO 2浓度被确定为7.09重量%。这种超声波技术将大大有助于极紫外光刻（EUVL）系统所需的超低膨胀玻璃的发展。
We obtained an accurate relationship between the leaky surface acoustic wave (LSAW) velocities and TiO2 concentrations. Such a relationship is needed for the line-focus-beam ultrasonic material characterization (LFB-UMC) system as a new technology for evaluating the coefficient of thermal expansion (CTE) of ultra-low-expansion glasses with extremely high precision. Using commercially available TiO2–SiO2 glass with periodic striae, averaged velocities for LSAW propagation parallel to the striae plane at 225 MHz and averaged TiO2 concentrations by X-ray fluorescence analysis were measured on the surface of seven specimen substrates prepared perpendicular to the striae plane. The obtained sensitivity of LSAW velocity to TiO2 concentration was -0.0601 wt %/(m/s), and the measurement resolution was estimated to be ±0.0084 wt % for ±2 σ (σ: standard deviation) from the LSAW velocity measurement resolution of ±0.14 m/s. The TiO2 concentration for the standard TiO2–SiO2 glass specimen with a LSAW velocity of 3308.18 m/s for system calibration was determined to be 7.09 wt %. This ultrasonic technology will contribute greatly to the development of the ultra-low-expansion glasses needed for extreme ultraviolet lithography (EUVL) systems.