A 2.2/3-inch 4K2K CMOS image sensor based on dual resolution and exposure technique

A 2.2/3-inch 4K2K CMOS image sensor based on dual resolution and exposure technique
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基于双分辨率和曝光技术的2.2/3英寸4K2K CMOS图像传感器

DOI：
10.1109/isscc.2010.5433977
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发表时间：
2010
期刊：
2010 IEEE International Solid-State Circuits Conference - (ISSCC)
影响因子：
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通讯作者：
Y. Kato
Y. Kato
中科院分区：
--
文献类型：
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作者：
Takeo Azuma;T. Imagawa;Sanzo Ugawa;Yusuke Okada;H. Komobuchi;M. Ishii;S. Kasuga;Y. Kato

文献摘要

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近期超高密度摄像机的趋势是从高清走向4K2K，并将进一步延伸至8K4K/便携式4K2K。随着器件制造工艺技术的进步，图像传感器的小型化以及高分辨率和高灵敏度的需求日益迫切[1]。
The recent trend in ultra-high-density cameras is running from HD to 4K2K, which will further extend to 8K4K / portable 4K2K. With advancements in device fabrication process technologies, there has been a pressing need for the miniaturization as well as high resolution and high sensitivity in image sensors [1].