Evaluation of threading dislocation density of strained Ge epitaxial layer by high resolution x-ray diffraction
Evaluation of threading dislocation density of strained Ge epitaxial layer by high resolution x-ray diffraction
复制标题
高分辨率X射线衍射评价应变Ge外延层的穿透位错密度
DOI:
10.1088/1674-1056/26/12/127309
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发表时间:
2017-12-01
影响因子:
1.7
通讯作者:
Zhang, He-Ming
中科院分区:
文献类型:
--
作者:
Miao, Yuan-Hao;Hu, Hui-Yong;Zhang, He-Ming
The analysis of threading dislocation density (TDD) in Ge-on-Si layer is critical for developing lasers, light emitting diodes (LEDs), photodetectors (PDs), modulators, waveguides, metal oxide semiconductor field effect transistors (MOSFETs), and also the integration of Si-based monolithic photonics. The TDD of Ge epitaxial layer is analyzed by etching or transmission electron microscope (TEM). However, high-resolution x-ray diffraction (HR-XRD) rocking curve provides an optional method to analyze the TDD in Ge layer. The theory model of TDD measurement from rocking curves was first used in zinc-blende semiconductors. In this paper, this method is extended to the case of strained Ge-on-Si layers. The HR-XRD 2 theta/omega scan is measured and Ge (004) single crystal rocking curve is utilized to calculate the TDD in strained Ge epitaxial layer. The rocking curve full width at half maximum (FWHM) broadening by incident beam divergence of the instrument, crystal size, and curvature of the crystal specimen is subtracted. The TDDs of samples A and B are calculated to be 1.41 x 108 cm(-2) and 6.47 x 108 cm(-2), respectively. In addition, we believe the TDDs calculated by this method to be the averaged dislocation density in the Ge epitaxial layer.