SEPARATE MEASUREMENTS OF DYNAMICAL AND KINEMATICAL X-RAY DIFFRACTIONS FROM SILICON-CRYSTALS WITH A TRIPLE CRYSTAL DIFFRACTOMETER
SEPARATE MEASUREMENTS OF DYNAMICAL AND KINEMATICAL X-RAY DIFFRACTIONS FROM SILICON-CRYSTALS WITH A TRIPLE CRYSTAL DIFFRACTOMETER
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DOI：
10.1002/pssa.2210510227
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发表时间：
1979-01-01
期刊：
影响因子：
--
通讯作者：
KOHRA, K
中科院分区：
文献类型：
--
作者：
IIDA, A;KOHRA, K
使用（+n，−n，+n）设置的三重晶体排列，在倒易晶格点附近分别测量来自完美和机械损伤硅单晶的衍射X射线的运动学和动力学分量。在理想晶体的情况下，除了正常的动力学衍射外，在散射矢量偏差小至2 × 103cm−1时，观察到由晶格振动引起的宽而弱的峰。对于具有研磨和刮擦表面的晶体，观察到强度曲线的显著变化，即倒数空间中的等强度轮廓的变化。
The kinematical and dynamical components of diffracted X‐rays from perfect and mechanically damaged silicon single crystals are separately measured in the vicinity of the reciprocal lattice point using a triple crystal arrangement of (+n, −n, +n) setting. In the case of a perfect erystal, besides the normal dynamical diffraction, a broad and weak hump due to the lattice vibration is observed at the scattering vector deviation as small as 2 × 103cm−1. For crystals with lapped and scratched surface a noticeable change of the intensity curves, i.e. a change of the equal‐intensity contour in the reciprocal space, is observed.