Electron Holography on Beam Sensitive Materials: Organic Polymers and Mesoporous Silica
Electron Holography on Beam Sensitive Materials: Organic Polymers and Mesoporous Silica
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电子全息束敏感材料：有机聚合物和介孔二氧化硅
DOI：
10.1021/cm011140q
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发表时间：
2002
期刊：
影响因子：
--
通讯作者：
G. Michler
中科院分区：
文献类型：
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作者：
P. Simon;R. Huhle;M. Lehmann;H. Lichte;D. Mönter;T. Bieber;W. Reschetilowski;R. Adhikari;G. Michler
为了通过常规电子显微镜研究弱相物体如聚合物，物体必须在成像之前染色或在强散焦下成像以在图像中找到足够的对比度。然而，这些技术具有伪像的风险，例如，化学染色和在散焦期间出现菲涅耳衍射现象。这些伪影在全息照相术中不会出现。因此，记录了有机嵌段共聚物的双截面（50 - 70 nm）的全息图，并重构了相应的相位图像。以这种方式，可以在没有任何染色的情况下成像典型的结构，例如薄片和洋葱图案。此外，我们成功地记录了介孔硅分子筛MCM-41的全息图，显示了六方排列的均匀尺寸的孔隙，而不使用散焦。全息术已被证明是一种可行的工具，图像光束敏感和弱相位物体无伪影。
For the investigation of weak phase objects such as polymers by means of conventional electron microscopy, the objects have to be stained prior to imaging or imaged under strong defocus to find a sufficient contrast in the image. However, these techniques bear the risk of artifacts, e.g., chemical staining and the appearance of Fresnel diffraction phenomena occurring during defocus. These artifacts do not appear with holography. Therefore, holograms of ultrathin sections (50−70 nm) of organic block copolymer were recorded, and the corresponding phase images were reconstructed. In this way, typical structures such as lamellae and onion patterns could be imaged without any staining. In addition, we successfully recorded holograms of mesoporous silica molecular sieve MCM-41 which show the hexagonal arrangement of uniformly sized porosities without using defocus. Holography has been demonstrated as a feasible tool to image beam sensitive and weak phase objects without artifacts.