Ionic fragmentation of SiH4 following the K-shell excitation
Ionic fragmentation of SiH4 following the K-shell excitation
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K 壳层激发后 SiH4 的离子碎裂
DOI:
10.1088/0031-8949/41/1/017
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发表时间:
1990
期刊:
影响因子:
--
通讯作者:
T. Hayaishi
中科院分区:
文献类型:
--
作者:
E. Shigemasa;K. Ueda;Yukinori Sato;A. Yagishita;H. Maezawa;Taizo Sasaki;M. Ukai;T. Hayaishi
Ionic fragmentation of SiH4 has been studied in the vicinity of the Si: K-edge in the photon energy range 1800-1900eV. Ionic fragments observed at photon energies above the Si: ls → σ* excitation are mostly atomic ions Siq+ (q = 1-3) and H+. Ratios of the abundances for Si+, and Si2+ and Si3+ are roughly 4:4:1, and the abundance of H+ is much higher than the sum of the Si+, Si2+ and Si3+ abundances. The averaged kinetic energy release given to H+ is estimated to be about 12eV. This complete decomposition of SiH4 with the ejection of energetic H+ is interpreted as Coulomb explosion of the multiply-charged (mainly +4 or +5) parent ion produced via the vacancy cascade (successive Auger and/or Coster-Kronig transitions).