ATOMISTIC MECHANISM OF SURFACTANT-ASSISTED EPITAXIAL GROWTH
ATOMISTIC MECHANISM OF SURFACTANT-ASSISTED EPITAXIAL GROWTH
复制标题
表面活性剂辅助外延生长的原子机制
DOI：
10.1103/physrevlett.81.850
复制
发表时间：
1998
影响因子：
8.6
通讯作者：
R. Miranda
中科院分区：
文献类型：
--
作者：
J. Camarero;J. Ferrón;V. Cros;L. Gómez;A. D. Parga;J. Gallego;J. Prieto;J. Miguel;R. Miranda
实验和模拟的表面活性剂对原子扩散的影响。沉积在Cu（111）表面上的Cu吸附原子通过与来自衬底的其它Cu原子交换位置而快速地被掩埋并扩散到Pb层下。表面活性剂通过抑制在梯田上扩散的跳跃机制并促进在梯田处和跨越台阶的原子交换来诱导逐层生长。这种机制可能是相当普遍的，并对人工材料的合成具有深远的影响。[S0031-9007（98）06721-0]
Experiments and simulations on the effect of a surfactant on atomic diffusion are presented. Cu adatoms deposited on a Cu(111) surface covered with a monolayer of Pb quickly get buried and diffuse under the Pb layer by exchanging sites with other Cu atoms from the substrate. The surfactant induces layer-by-layer growth by suppressing the hopping mechanism of diffusion over the terraces and promoting atomic exchange, both at the terraces and across the steps. This mechanism may be rather general and has profound implications for the synthesis of artificial materials. [S0031-9007(98)06721-0]