Field-emission of spin-polarized electrons from Cr thin film grown on W{113} surfaces
Field-emission of spin-polarized electrons from Cr thin film grown on W{113} surfaces
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W{113} 表面生长的 Cr 薄膜的自旋极化电子场发射
DOI：
10.1109/ivnc.2018.8520268
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发表时间：
2018
期刊：
影响因子：
--
通讯作者：
Koichi Hata
中科院分区：
文献类型：
--
作者：
Shigekazu Nagai;Kento Miyazaki;Kazuya Kunoh;Tatsuo Iwata;Koichi Hata
在室温下测量了生长在W{113}面上的Cr薄膜经1000 K退火后的场发射电子的自旋极化。30%的自旋极化幅度是Cr（001）表面的三分之二，这对应于Cr（001）层中具有多数自旋的原子数量的一小部分。另一方面，Cr/W（113）场致发射体的发射电流与常规场致发射体相当，自旋极化电子源的品质因数比Cr/W（001）场致发射体高两个数量级。
Spin polarization of field-emitted electrons from a Cr thin film grown on W{113 facets after annealing at 1000 K was measured at room temperature. The magnitude of spin polarization of 30% was two thirds of that of a Cr(001) surface, which corresponds to a fraction of the number of atoms with majority spin in Cr(001) layers. On the other hand, the emission current from Cr/W{113 was comparable to conventional field emitters so that figure of merit for spin polarized electron sources was two orders of magnitude higher than that for the Cr/W(001) emitter in previous strudy.