Effects of atmosphere composition during direct ultraviolet-light patterning of solution-deposited In2O3 thin film transistors

Effects of atmosphere composition during direct ultraviolet-light patterning of solution-deposited In2O3 thin film transistors
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DOI:
10.1016/j.tsf.2021.138829
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发表时间:
2021-09
期刊:
影响因子:
2.1
通讯作者:
T. Daunis;Weijie Xu;S. Thampy;Marisol Valdez;J. Hsu
T. Daunis;Weijie Xu;S. Thampy;Marisol Valdez;J. Hsu
中科院分区:
材料科学3区
文献类型:
--
作者:
T. Daunis;Weijie Xu;S. Thampy;Marisol Valdez;J. Hsu

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