Effect of substrate bias voltage on the microstructure and electrical properties of Pt films deposited by ion beam deposition

Effect of substrate bias voltage on the microstructure and electrical properties of Pt films deposited by ion beam deposition
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衬底偏压对离子束沉积Pt薄膜微观结构和电学性能的影响

DOI:
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发表时间:
2006
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影响因子:
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通讯作者:
J. -W. Bae
J. -W. Bae
中科院分区:
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文献类型:
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作者:
Kouji Mimura J.-W. Lim;G.-S. Choi;Minoru Isshiki;藤田健資;Kouji Mimura;M. Isshiki;M. Isshiki;Jae-Won Lim;J.-W. Lim;J. -W. Lime;J. -W. Bae

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