Direct Transcription of Two‐Dimensional Colloidal Crystal Arrays into Three‐Dimensional Photonic Crystals
Direct Transcription of Two‐Dimensional Colloidal Crystal Arrays into Three‐Dimensional Photonic Crystals
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DOI：
10.1002/adfm.201201138
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发表时间：
2013-03
影响因子：
19
通讯作者：
A. Vlad;A. Frölich;T. Zebrowski;C. Dutu;K. Busch;S. Melinte;M. Wegener;I. Huynen
中科院分区：
文献类型：
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作者：
A. Vlad;A. Frölich;T. Zebrowski;C. Dutu;K. Busch;S. Melinte;M. Wegener;I. Huynen
提出了一种用于在硅中制造三维（3D）光子晶体的简单协议。表面结构的纳米球光刻合并与一种新的硅蚀刻方法制造有序的3D架构。SPRIE方法，即顺序钝化反应离子蚀刻，是一种一步处理方案，依赖于使用C4F8和SF6等离子体化学的顺序钝化和反应离子蚀刻反应。新的反应物和蚀刻产物物种内的蚀刻通道的扩散被发现发挥重要的作用，影响所设计的结构的结构均匀性和蚀刻速率漂移校正通过调整反应时间。因此，通过SPRIE将第三维添加到二维（2D）胶体晶体组装体中获得高质量的光子晶体。掩模设计和横向蚀刻程度平衡的仔细调整允许实现甚至更复杂的功能，包括光子晶体板和精确的缺陷工程。展示了在红外光谱区显示光学阻带的3D光子晶体晶格，证明了SPRIE用于快速，简单和大规模制造光子结构的潜力。
A simple protocol for the fabrication of three‐dimensional (3D) photonic crystals in silicon is presented. Surface structuring by nanosphere lithography is merged with a novel silicon etching method to fabricate ordered 3D architectures. The SPRIE method, sequential passivation reactive ion etching, is a one‐step processing protocol relying on sequential passivation and reactive ion etching reactions using C4F8 and SF6 plasma chemistries. The diffusion of fresh reactants and etch product species inside the etched channels is found to play an important role affecting the structural uniformity of the designed structures and the etch rate drift is corrected by adjusting the reaction times. High quality photonic crystals are thus obtained by adding the third dimension to the two‐dimensional (2D) colloidal crystal assemblies through SPRIE. Careful adjustments of both mask design and lateral etch extent balance allow the implementation of even more complex functionalities including photonic crystal slabs and precise defect engineering. 3D photonic crystal lattices exhibiting optical stop‐bands in the infrared spectral region are demonstrated, proving the potential of SPRIE for fast, simple, and large‐scale fabrication of photonic structures.