Explicit Analytical Solutions for a Complete Set of the Eshelby Tensors of an Ellipsoidal Inclusion
Explicit Analytical Solutions for a Complete Set of the Eshelby Tensors of an Ellipsoidal Inclusion
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椭球体包裹体完整 Eshelby 张量集的显式解析解
DOI:
10.1115/1.4034705
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发表时间:
2016-12
期刊:
影响因子:
--
通讯作者:
Leon M. Keer
中科院分区:
文献类型:
--
作者:
Xiaoqing Jin;Ding Lyu;Xiangning Zhang;Qinghua Zhou;Qian Wang;Leon M. Keer
The celebrated solution of the Eshelby ellipsoidal inclusion has laid the cornerstone for many fundamental aspects of micromechanics. A well-known difficulty of this classical solution is to determine the elastic field outside the ellipsoidal inclusion. In this paper, we first analytically present the full displacement field of an ellipsoidal inclusion subjected to uniform eigenstrain. It is demonstrated that the displacements inside inclusion are linearly related to the coordinates and continuous across the interface of inclusion and matrix. The exterior displacement, which is less detailed in existing literatures, may be expressed in a more compact, explicit, and simpler form through utilizing the outward unit normal vector of an auxiliary confocal ellipsoid. Other than many practical applications in geological engineering, the displacement solution can be a convenient starting point to derive the deformation gradient, and subsequently in a straightforward manner to accomplish the full-field solutions of the strain and stress. Following Eshelby's definition, a complete set of the Eshelby tensors corresponding to the displacement, deformation gradient, strain, and stress are expressed in explicit analytical form. Furthermore, the jump conditions to quantify the discontinuities across the interface are discussed and a benchmark problem is provided to validate the present formulation.
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影响因子:
6.2
作者:
Zhou Qinghua;Jin Xiaoqing;Wang Zhanjiang;Wang Jiaxu
通讯作者:
Wang Jiaxu
影响因子:
4.4
作者:
Meng, Chunfang;Heltsley, Will;Pollard, David D.
通讯作者:
Pollard, David D.
DOI:
10.1115/1.3167076
发表时间:
1982
期刊:
--
影响因子:
--
作者:
T. Mura;D. Barnett
通讯作者:
T. Mura;D. Barnett
影响因子:
2.1
作者:
V. Silberschmidt
通讯作者:
V. Silberschmidt
影响因子:
2
作者:
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通讯作者:
Xiaoqing Jin;Zhanjiang Wang;Qinghua Zhou;L. Keer;Q. Wang